PART/ mag.x 125
Système de microscope à champ large mag.x 125
Le système de microscope grand champ Optem® mag.x 125 représente une nouvelle catégorie de systèmes optiques, combinant une résolution semblable à celle d’un microscope avec de vastes champs de vision pour prendre en charge les capteurs haute résolution modernes jusqu’à 57 mm de diamètre. Its enhanced autofocus capability delivers exceptional speed, precision, and reliability for advanced metrology and inspection applications. The fully modular design can be configured for a wide range of applications, from a straightforward optical system without illumination to a fully featured configuration incorporating coaxial illumination and closed-loop autofocus.
High-speed, high-precision autofocus capability
The Optem mag.x 125 widefield microscope system features an updated autofocus sensor and focus actuator hardware, delivering fast, precise, and repeatable performance for demanding inspection and metrology applications. Designed for high-throughput inspection of flat-panel displays, wafers, and advanced packaging, the system combines rapid focus tracking with nanometer-level Z-axis positioning to maintain image quality, measurement accuracy, and throughput.
Modular design for high-resolution imaging
High-resolution inspection applications demand flexibility, precision, and seamless integration. The mag.x 125 system offers a fully modular platform that can be easily integrated with a wide range of objective lenses, tube lenses, illumination tubes, autofocus modules, mounting plates, and other accessories to meet specific application requirements.
| Objective Lens - Plan Apochromat | Système à lentille tubulaire | |||||||||||||||
| Mtub : 1x | Mtub : 2.25x | |||||||||||||||
| f'tub : 250 mm | f'tub : 563 mm | |||||||||||||||
| 2y' : 25 mm | 2y' : 56.3 mm | |||||||||||||||
| Magn./NA | WD | f'obj. | δ obj | R0 | M | 2y | NA' | R'0 | M | 2y | NA' | R'0 | ||||
| mm | mm | µm | lp/mm | mm | lp/mm | mm | lp/mm | |||||||||
| 2x/0.08 | 24 | 125,0 | ± 42,7 | 293 | 2,0 | 12,5 | 0,04 | 147 | 4,5 | 12,5 | 0,018 | 65 | ||||
| 5x/0.20 | 13 | 50,0 | ± 6,8 | 733 | 5,0 | 5,0 | 0,04 | 147 | 11,25 | 5,0 | 0,018 | 65 | ||||
| 8x/0.32 | 23 | 31,3 | ± 2,7 | 1172 | 8,0 | 3,1 | 0,04 | 147 | 18,0 | 3,1 | 0,018 | 65 | ||||
NA Numerical aperture in the object space; NA=n * sin (σ)
WD Working distance
f'obj Focal length of the objective lense
f'tub : Distance focale des lentilles de tube
δobj Depth of field at 546 nm; δobj = ± n * λ/(2*NA2)
R0 Cut off frequency in object space at 546 nm; R0 = (2*NA) / λ
R0' Cut off frequency in image space at 546 nm; R0' = R0 /M
2y' Image field size (maximum detector diagonal)
2y Object field size
M Magnification of the overall system; M = Mobj * Mtub
Une mécanique de précision avec une conception optique novatrice
Exact telecentricity on both the object and image sides
Diffraction-limited optical performance across the complete image circle
Mise au point précise et dynamique
Modular, configurable architecture for easy system integration
Inspection et traitement des semiconducteurs
Flat-panel display processing (TFT and OLED)
Printed circuit board (PCB) processing
Micro measurement and metrology
Microscopie par fluorescence
Pathologie numérique
| Objective Lens - Plan Apochromat | Système à lentille tubulaire | |||||||||||||||
| Mtub : 1x | Mtub : 2.25x | |||||||||||||||
| f'tub : 250 mm | f'tub : 563 mm | |||||||||||||||
| 2y' : 25 mm | 2y' : 56.3 mm | |||||||||||||||
| Magn./NA | WD | f'obj. | δ obj | R0 | M | 2y | NA' | R'0 | M | 2y | NA' | R'0 | ||||
| mm | mm | µm | lp/mm | mm | lp/mm | mm | lp/mm | |||||||||
| 2x/0.08 | 24 | 125,0 | ± 42,7 | 293 | 2,0 | 12,5 | 0,04 | 147 | 4,5 | 12,5 | 0,018 | 65 | ||||
| 5x/0.20 | 13 | 50,0 | ± 6,8 | 733 | 5,0 | 5,0 | 0,04 | 147 | 11,25 | 5,0 | 0,018 | 65 | ||||
| 8x/0.32 | 23 | 31,3 | ± 2,7 | 1172 | 8,0 | 3,1 | 0,04 | 147 | 18,0 | 3,1 | 0,018 | 65 | ||||
NA Numerical aperture in the object space; NA=n * sin (σ)
WD Working distance
f'obj Focal length of the objective lense
f'tub : Distance focale des lentilles de tube
δobj Depth of field at 546 nm; δobj = ± n * λ/(2*NA2)
R0 Cut off frequency in object space at 546 nm; R0 = (2*NA) / λ
R0' Cut off frequency in image space at 546 nm; R0' = R0 /M
2y' Image field size (maximum detector diagonal)
2y Object field size
M Magnification of the overall system; M = Mobj * Mtub
Une mécanique de précision avec une conception optique novatrice
Exact telecentricity on both the object and image sides
Diffraction-limited optical performance across the complete image circle
Mise au point précise et dynamique
Modular, configurable architecture for easy system integration
Inspection et traitement des semiconducteurs
Flat-panel display processing (TFT and OLED)
Printed circuit board (PCB) processing
Micro measurement and metrology
Microscopie par fluorescence
Pathologie numérique