Dielectric-Coated Plane Mirrors DLB UV 230-400 nm
LINOS® DLB UV 230–400 nm Dielectric-Coated Plane Mirrors are engineered for high-power and high-energy laser applications, combining durability with superior optical performance. Featuring a dielectric laser coating, these mirrors deliver high reflectivity across a broad UV range and maintain excellent performance over angles of incidence from 0° to 45°. Optimized for beam steering at a 45° angle of incidence, they provide precise 90° beam deflection while minimizing scattering losses. The polished back surface enhances mechanical stability and handling, reducing stress and potential damage during installation and operation.
Built on a fused silica substrate, these mirrors provide excellent thermal and mechanical stability. Their low-loss reflection, durability, and precise beam control make them well-suited for demanding UV laser setups, delivering consistent performance in research and industrial environments.
| Product | Laser Mirror DLB UV 230-400; Fused Silica; D=25 | Laser Mirror DLB UV 230-400; Fused Silica; D=50 |
| Weight (kg) | 0.006 | 0.046 |
| Shape | Circular | Circular |
| Optic Size | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 10.0 mm |
| Wavelength Range | 230.0 - 400.0 nm | 230.0 - 400.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica |
Ensures reliable performance under intense laser conditions, reducing the risk of damage or downtime essential for high-power / high-energy laser applications
Dielectric laser mirror provides extremely high reflectivity and low loss
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
High reflectivity for angles of incidence between 0° and 45° offers flexibility in optical design without compromising performance
Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power
R avg > 96 % at 230 - 300 nm (AOI = 45°, unpolarized)
R avg > 98 % at 300 - 400 nm (AOI = 45°, unpolarized)
| Product | Laser Mirror DLB UV 230-400; Fused Silica; D=25 | Laser Mirror DLB UV 230-400; Fused Silica; D=50 |
| Weight (kg) | 0.006 | 0.046 |
| Shape | Circular | Circular |
| Optic Size | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 10.0 mm |
| Wavelength Range | 230.0 - 400.0 nm | 230.0 - 400.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica |
Ensures reliable performance under intense laser conditions, reducing the risk of damage or downtime essential for high-power / high-energy laser applications
Dielectric laser mirror provides extremely high reflectivity and low loss
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
High reflectivity for angles of incidence between 0° and 45° offers flexibility in optical design without compromising performance
Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power
R avg > 96 % at 230 - 300 nm (AOI = 45°, unpolarized)
R avg > 98 % at 300 - 400 nm (AOI = 45°, unpolarized)