Dielectric-Coated Plane Mirrors DLHS UV 266 nm
LINOS® Dielectric-Coated Plane Mirrors DLHS UV 266 nm are precision optical components engineered for high-power and high-energy laser applications. Featuring a dielectric VUV high-power coating, these mirrors deliver exceptionally high reflection with ultra-low scattering losses, ensuring reliable performance in critical beam steering and deflection tasks. Optimized for 45° angles of incidence, they provide precise 90° beam deflection and can also function as dichroic or longpass mirrors for selective wavelength separation. Constructed on fused silica substrates with highly polished front and back surfaces, they maintain excellent thermal and dimensional stability.
DLHS mirrors offer over 99% reflection at 266 nm, providing optical precision, durability, and long-term stability. They are well-suited for advanced laser systems, scientific research, and demanding industrial applications.
| Product | Laser Mirror DLHS266; Fused silica; D=12.7 | Laser Mirror DLHS266; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS266; Fused silica; D=25 |
| Weight (kg) | 0.003 | 0.008 | 0.008 |
| Shape | Circular | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm |
| Wavelength Range | 266.0 nm | 266.0 nm | 266.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg |
| Substrate | Fused Silica | Fused Silica | Fused Silica |
Dielectric VUV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Polished back surface (only fused silica) minimizes stray reflections and scattering, improving beam quality and precision
Extreme low scattering losses preserves beam intensity and uniformity for high-accuracy optical applications
Fused silica substrate provides excellent thermal and mechanical stability, reducing distortion under varying conditions
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99 % at 266 nm for AOI = 45° (average polarization)
Transmission >80 % for λ = 532, 810 and 1064 nm can be achieved with an additional anti-reflection (AR) coating on the backside
Damage thresholds H∞ > 5 J / cm2 at 308 nm with 15 ns laser pulses (s-on-1) at 10 Hz
| Product | Laser Mirror DLHS266; Fused silica; D=12.7 | Laser Mirror DLHS266; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS266; Fused silica; D=25 |
| Weight (kg) | 0.003 | 0.008 | 0.008 |
| Shape | Circular | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm |
| Wavelength Range | 266.0 nm | 266.0 nm | 266.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg |
| Substrate | Fused Silica | Fused Silica | Fused Silica |
Dielectric VUV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Polished back surface (only fused silica) minimizes stray reflections and scattering, improving beam quality and precision
Extreme low scattering losses preserves beam intensity and uniformity for high-accuracy optical applications
Fused silica substrate provides excellent thermal and mechanical stability, reducing distortion under varying conditions
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99 % at 266 nm for AOI = 45° (average polarization)
Transmission >80 % for λ = 532, 810 and 1064 nm can be achieved with an additional anti-reflection (AR) coating on the backside
Damage thresholds H∞ > 5 J / cm2 at 308 nm with 15 ns laser pulses (s-on-1) at 10 Hz