Dielectric-Coated Plane Mirrors DLHS 532 nm
LINOS® Dielectric-Coated Plane Mirrors DLHS 532 nm are precision optical components engineered for high-power and high-energy laser applications. Featuring a dielectric coating, these mirrors provide exceptionally high reflectivity with extremely low scattering losses, ensuring reliable performance in critical beam steering and deflection tasks. Optimized for a 45° angle of incidence, they deliver precise 90° beam deflection and can also serve as dichroic or longpass mirrors for selective wavelength separation. Constructed on fused silica substrates with highly polished front and back surfaces, they maintain excellent thermal and dimensional stability under demanding conditions.
LINOS DLHS mirrors offer over 99.7% reflection at 532 nm, providing optical precision, durability, and reliability for advanced laser systems, scientific research, and high-power industrial applications.
| Product | Laser Mirror DLHS532; Fused silica; D=12.7 | Laser Mirror DLHS532; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS532; Fused silica; D=25 | Laser Mirror DLHS532; Fused silica; D=50 |
| Weight (kg) | 0.003 | 0.008 | 0.008 | 0.043 |
| Shape | Circular | Elliptical | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm | 10.0 mm |
| Wavelength Range | 532.0 nm | 532.0 nm | 532.0 nm | 532.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg | 45 deg |
| Coating Specification |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
| Parallelism | 5.0 | 5.0 | 5.0 | 5.0 |
Ensures reliable performance under intense laser conditions, reducing the risk of damage or downtime essential for high-power / high-energy laser applications
Mirror with dielectric high power coating provides extremely high reflectivity and low loss
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Also suitable as dichroit / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.7 % for 532 nm for AOI = 45° (average polarization)
Transmission > 80 % at λ = 1064 nm allows efficient passage of secondary wavelengths, supporting dual-wavelength applications
| Product | Laser Mirror DLHS532; Fused silica; D=12.7 | Laser Mirror DLHS532; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS532; Fused silica; D=25 | Laser Mirror DLHS532; Fused silica; D=50 |
| Weight (kg) | 0.003 | 0.008 | 0.008 | 0.043 |
| Shape | Circular | Elliptical | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm | 10.0 mm |
| Wavelength Range | 532.0 nm | 532.0 nm | 532.0 nm | 532.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg | 45 deg |
| Coating Specification |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
1x R>99.7% @532 nm, T>80% @1064 nm 1x uncoated |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
| Parallelism | 5.0 | 5.0 | 5.0 | 5.0 |
Ensures reliable performance under intense laser conditions, reducing the risk of damage or downtime essential for high-power / high-energy laser applications
Mirror with dielectric high power coating provides extremely high reflectivity and low loss
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Also suitable as dichroit / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.7 % for 532 nm for AOI = 45° (average polarization)
Transmission > 80 % at λ = 1064 nm allows efficient passage of secondary wavelengths, supporting dual-wavelength applications