Dielectric-Coated Plane Mirrors DLHS UV 405 nm
LINOS® Dielectric-Coated Plane Mirrors DLHS UV 405 nm are precision optical components designed for high-power and high-energy laser applications. Featuring a dielectric UV high-power coating, these mirrors provide exceptionally high reflectivity with extremely low scattering losses, ensuring reliable performance in demanding beam-steering tasks. Optimized for angles of incidence from 0° to 50°, they deliver precise beam redirection and can also function as dichroic or longpass mirrors for wavelength-selective applications. Constructed on fused silica substrates with highly polished front and back surfaces, they offer excellent thermal stability and minimal distortion.
With guaranteed reflection exceeding 99.5 % at 405 nm, DLHS mirrors combine optical precision, durability, and long-term reliability, making them ideal for advanced laser systems, scientific research, and high-power industrial applications.
| Product | Laser Mirror DLHS405; Fused silica; D=12.7 | Laser Mirror DLHS405; Fused silica; D=22.4x31 elliptical |
| Weight (kg) | 0.003 | 0.008 |
| Shape | Elliptical | Elliptical |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm |
| Wavelength Range | 405.0 nm | 405.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica |
Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Beam steering mirror for 0 - 50° angle of incidence
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.5 % at 405 nm, both with AOI = 0° or AOI = 45° (average polarization)
Transmission >80% for 480 nm < λ < 1100 nm (at 45° AOI) supporting dual-wavelength applications can be achieved with an additional anti-reflection (AR) coating on the backside
Damage thresholds H∞ > 5 J / cm2 at 308 nm with 15 ns laser pulses (s-on-1) at 10 Hz
| Product | Laser Mirror DLHS405; Fused silica; D=12.7 | Laser Mirror DLHS405; Fused silica; D=22.4x31 elliptical |
| Weight (kg) | 0.003 | 0.008 |
| Shape | Elliptical | Elliptical |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm |
| Wavelength Range | 405.0 nm | 405.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica |
Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Beam steering mirror for 0 - 50° angle of incidence
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.5 % at 405 nm, both with AOI = 0° or AOI = 45° (average polarization)
Transmission >80% for 480 nm < λ < 1100 nm (at 45° AOI) supporting dual-wavelength applications can be achieved with an additional anti-reflection (AR) coating on the backside
Damage thresholds H∞ > 5 J / cm2 at 308 nm with 15 ns laser pulses (s-on-1) at 10 Hz