SILFLEX High Reflectivity Silver Mirrors
LINOS® SILFLEX High Reflectivity Silver Mirrors are precision front-surface mirrors designed for multimedia, show, and projection systems. Produced with our patented sputter technique, these mirrors deliver exceptional stability and long operational life, maintaining consistent performance in demanding environments. SILFLEX-VIS mirrors achieve over 98% reflectance in the visible spectrum, with no polarization or unwanted light effects, making them ideal for high-fidelity optical applications. Constructed on heat-resistant borosilicate glass substrates, they offer both durability and precise surface flatness.
Standard sizes are available, and larger custom versions can be manufactured upon request to meet specific system requirements. SILFLEX mirrors produced by Optics Balzers provide reliable, high-performance reflection suitable for advanced projection, display, and optical imaging applications.
| Product | Pl. Mirror Silflex-VIS; D=110x160 | Pl. Mirror Silfex-VIS; D=50x50 | Pl. Mirror Silflex VIS; D=25x25 | Pl. Mirror Silflex VIS; D=50 | Pl. Mirror Silflex VIS; D=25 |
| Shape | Rectangular | Rectangular | Circular | Circular | |
| Optic Size | 110.0 - 160.0 mm | 50.0 mm | 25.0 mm | Ø 50.0 mm | Ø 25.0 mm |
| Optic Center Thickness | 1.1 mm | 1.1 mm | 1.1 mm | 1.1 mm | 1.1 mm |
| Wavelength Range | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg |
| Coating Specification | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) |
Front surface mirrors for multimedia-, show- and projection systems
No polarization and light effects ideal for demanding visual and projection environments
Long-life erduces replacement frequency
High stability due to patented Sputter technique provides superior coating adhesion and uniformity
Substrate made of heat-resistant borosilicate glass offers excellent thermal stability and mechanical robustness
Extremely high reflection in the VIS (R > 98% for 420–680 nm, AOI = 0°–45°) maximizes brightness and contrast
Mirror thickness of 1.1 mm enables lightweight and compact optical designs without compromising mechanical stability
Special sizes up to 160 mm × 110 mm available on request, allows flexible system integration and custom designs tailored to specific application requirements
| Product | Pl. Mirror Silflex-VIS; D=110x160 | Pl. Mirror Silfex-VIS; D=50x50 | Pl. Mirror Silflex VIS; D=25x25 | Pl. Mirror Silflex VIS; D=50 | Pl. Mirror Silflex VIS; D=25 |
| Shape | Rectangular | Rectangular | Circular | Circular | |
| Optic Size | 110.0 - 160.0 mm | 50.0 mm | 25.0 mm | Ø 50.0 mm | Ø 25.0 mm |
| Optic Center Thickness | 1.1 mm | 1.1 mm | 1.1 mm | 1.1 mm | 1.1 mm |
| Wavelength Range | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm | 420.0 - 680.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg |
| Coating Specification | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) | Ravg>98% @420-680 nm (AOI=45°) |
Front surface mirrors for multimedia-, show- and projection systems
No polarization and light effects ideal for demanding visual and projection environments
Long-life erduces replacement frequency
High stability due to patented Sputter technique provides superior coating adhesion and uniformity
Substrate made of heat-resistant borosilicate glass offers excellent thermal stability and mechanical robustness
Extremely high reflection in the VIS (R > 98% for 420–680 nm, AOI = 0°–45°) maximizes brightness and contrast
Mirror thickness of 1.1 mm enables lightweight and compact optical designs without compromising mechanical stability
Special sizes up to 160 mm × 110 mm available on request, allows flexible system integration and custom designs tailored to specific application requirements